Vacuum system for immersion photolithography

ABSTRACT

A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.

FIELD OF THE INVENTION

This invention relates to a vacuum system for extracting a multi-phasefluid, and more particularly for extracting a multi-phase fluid from animmersion photolithography exposure tool.

BACKGROUND OF THE INVENTION

Photolithography is an important process step in semiconductor devicefabrication. In photolithography, a circuit design is transferred to awafer through a pattern imaged onto a photoresist layer deposited on thewafer surface. The wafer then undergoes various etch and depositionprocesses before a new design is transferred to the wafer surface. Thiscyclical process continues, building up multiple layers of thesemiconductor device.

The minimum feature that may be printed using photolithography isdetermined by the resolution limit W, which is defined by the Rayleighequation as:

$\begin{matrix}{W = \frac{k_{1}\lambda}{NA}} & (1)\end{matrix}$

where k₁ is the resolution factor, λ is the wavelength of the exposingradiation and NA is the numerical aperture. In lithographic processesused in the manufacture of semiconductor devices, it is thereforeadvantageous to use radiation of very short wavelength in order toimprove optical resolution so that very small features in the device maybe accurately reproduced. Monochromatic visible light of variouswavelengths have been used, and more recently radiation in the deepultra violet (DUV) range has been used, including radiation at 193 nm asgenerated using an ArF excimer laser.

The value of NA is determined by the acceptance angle (α) of the lensand the index of refraction (n) of the medium surrounding the lens, andis given by the equation:

NA=n sin α  (2)

For clean dry air (CDA), the value of n is 1, and so the physical limitto NA for a lithographic technique using CDA as a medium between thelens and the wafer is 1, with the practical limit being currently around0.9.

Immersion photolithography is a known technique for improving opticalresolution by increasing the value of NA. With reference to FIG. 1, inthis technique a liquid 10 having a refractive index n >1 is placedbetween the lower surface of the objective lens 12 of a projectiondevice 14 and the upper surface of a wafer 16 located on a moveablewafer stage 18. The liquid placed between lens 12 and wafer 16 should,ideally, have a low optical absorption at 193 nm, be compatible with thelens material and the photoresist deposited on the wafer surface, andhave good uniformity. These criteria are met by ultra-pure, degassedwater, which has a refractive index n≈1.44. The increased value of n, Incomparison to a technique where the medium between lens and wafer isCDA, increases the value of NA, which in turn decreases the resolutionlimit W, enabling smaller features to be reproduced.

Due to outgassing from the photoresist layer and the generation ofparticulates during photolithography, it is desirable to maintain asteady flow of water between the lens 12 and the wafer 16. For example,as described in US 2004/0076895 the lens and wafer could be immersed ina bath of water supported by the wafer stage, with a pump used torecirculate the water within the bath. However, due to the weight of thewater bath acting on the wafer stage, this technique is generallyconsidered undesirable.

An alternative technique, as shown in FIG. 1, is to use a nozzle orshowerhead device 20 connected to a water source and a vacuum system,shown generally at 22, to produce a localized stream of ultra-pure,degassed water between the lens 12 and the wafer 16. To prevent theingress of water into other parts of the tool, for example, themechanism used to move the wafer stage 18, one or more differential airseals 24 are used. As a result, the vacuum system 22 extracts from thetool a multi-phase mixture of water and CDA. However, the extraction ofsuch a multi-phase mixture from the tool using a single vacuum pump,especially in slug or churn regime flows, can generate undesirablepressure and flow fluctuations upstream of the pump, which could betransmitted back to the tool. This could lead to errors in thephotolithography process, for example, through variations in therefractive index of the medium located between the lens and the wafer,or through the transmission of mechanical vibrations to the tool.

It is an object of the present invention to provide a vacuum system forextracting a stream of a multi-phase fluid from a photolithography tooland which can minimize any pressure fluctuations imparted thereby tofluid within the tool.

SUMMARY OF THE INVENTION

In a first aspect, the present invention provides a system forextracting a stream of multi-phase fluid from a photo-lithography tool,the system comprising a pumping arrangement for drawing the fluid fromthe tool, separating means located upstream from the pumping arrangementfor separating the fluid drawn from the tool into gas and liquid phases,the pumping arrangement comprising a first pumping unit for extractinggas from the separating means and a second pumping unit for extractingliquid from the separating means, and a pressure control system forcontrolling the pressure within the separating means by regulating theamounts of gas and liquid therewithin.

In order to minimize any pressure fluctuations transmitted from thesystem back to the fluid within the tool, the pressure control systemcan maintain a substantially constant pressure in the separating meansby regulating the amounts of liquid and gas within the separating means.

In order to control the amount of gas within the separating means, thepressure control system preferably comprises means for supplying gas tothe separating means from a source thereof, and control means forcontrolling the flow of gas to the separating means. For example, wherethere is a variation in the flow of fluid into the separating means,and/or a variation in the flow of gas from the separating means, gas canbe introduced into the separating means from the external source tocompensate for such variations. In a preferred embodiment, the pressurecontrol system comprises a variable flow control device, such as abutterfly or other control valve, through which gas is supplied to theseparating means, with the control means being configured to vary theconductance of the valve to control the pressure within the separatingmeans. For example, a controller may be configured to receive a signalindicative of the pressure within the separating means, and to controlthe conductance of the valve in dependence on the received signal. Thissignal may be received from a pressure sensor, capacitance manometer orother form of sensor of sufficient sensitivity to achieve the requiredlevel of pressure control.

As well as, or as an alternative to, controlling the supply of gas tothe separating means, the controller is preferably configured to controlthe flow of gas from the separating means in dependence on the receivedsignal. For example, another variable flow control device may beprovided, through which gas is extracted from the tank by the firstpumping unit, with the controller being configured to control theconductance of this variable flow control device.

In order to control the amount of liquid in the separating means, thepressure control system preferably comprises means for supplying liquidto the separating means from a source thereof, and control means forcontrolling the flow of liquid to the separating means. For example, inorder to minimize pressure variations due to the extraction of liquidfrom the separating means by the second pumping unit, the control meansis preferably configured to maintain a substantially constant level ofliquid within the separating means. In another preferred embodiment, theliquid supply means comprises a variable flow control device such as abutterfly or other control valve, through which liquid is supplied tothe separating means, with the control means being configured to varythe conductance of the valve to control the level of liquid within theseparating means. For example, a controller may be configured to receivea signal indicative of the level of liquid within the separating means,and to control the conductance of the valve in dependence on thereceived signal. This signal may be received from a level meter, floatdetector, or other form of sensor of sufficient sensitivity to allow asubstantially constant level of liquid to be maintained within theseparating means.

One or more flexible tubes are preferably used to convey fluid (singleand/or multi-phase) between the components of the system. For example, aflexible tube may be used to convey the multi-phase fluid to theseparating means. Further flexible tubes may also be used to convey thesingle phase streams from the separating means to respective pumpingunits. This can minimize the transmission of vibrations generated duringuse of the system back to the fluid within the tool.

In another aspect of the present invention, a method is provided forextracting a stream of multi-phase fluid from a photo-lithography tool,the method comprising the steps of: connecting a pumping arrangement tothe tool via an extraction tank; operating the pumping arrangement todraw the fluid from the tool; separating the fluid drawn from the toolinto gas and liquid phases within the extraction tank, the pumpingarrangement extracting separately gas and liquid from the extractiontank; and controlling the pressure within the extraction tank byregulating the amounts of gas and liquid therewithin.

Features described above in relation to system aspects of the inventionare equally applicable to method aspects, and vice versa.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 schematically illustrates a known system for immersionphotolithography; and

FIG. 2 schematically illustrates the present invention vacuum system forextracting a multi-phase fluid from an immersion photolithography tool.

DETAILED DESCRIPTION OF THE INVENTION

With reference to FIG. 2, a system 30 for extracting a multi-phase fluidfrom an immersion photolithography tool comprises a separating meansdepicted for purposes of illustration as an extraction tank 32 forreceiving the multi-stream fluid drawn from the tool by a pumpingarrangement located downstream from the tank 32. The tank 32 isconnected to the tool by flexible tubing 34 so as to minimize the amountof mechanical coupling between the system 30 and the tool, and therebyminimize the transmission of vibrations generated during use of thesystem 30 back to the tool.

The tank 32 is configured to separate the liquid and gas phases withinthe fluid received from the tool. In this example, the fluid receivedfrom the tool comprises a mixture of clean dry air (CDA) and ultra-purewater, and so the tank 32 contains any suitable material and/orstructure for affecting the separation of the CDA from the water.However, the tank 32 may be configured to separate a differentliquid-gas mixture received from the tool. For example, the liquid maycomprise an aqueous or non-aqueous solution, and the gas may be otherthan CDA.

The pumping arrangement comprises a first pumping unit 36 for extractinggas from the tank 32, and a second pumping unit 38 for extracting liquidfrom the tank 32.

The first pumping unit 36 may comprise any suitable pump for extractingthe gas from the tank 32, and is preferably chosen for compatibilitywith the gas extracted from the tank 32, which is likely to be saturatedwith liquid vapour, for minimum transmission of pressure fluctuationsback to the gas contained in the tank 32, and for relatively longmaintenance periods. In this embodiment, the first pumping unit 36 mayconveniently comprise an air-powered ejector pump or a water-basedliquid ring pump for extracting CDA from the tank 32. In order toinhibit the transfer of vibrations to the tank 32 during use, the firstpumping unit 36 is connected to the tank using flexible tubing 40. Asthe gas exhaust from the first pumping unit 36 may be saturated orsupersaturated with liquid vapour, in this embodiment water vapour, aseparator vessel 42 may be connected to the exhaust of the first pumpingunit 36, the vessel 42 containing any suitable material and/or structurefor affecting the separation of water vapour from the CDA. The waterextracted from the CDA is exhaust to a drain, and the CDA is vented tothe atmosphere.

The second pumping unit 38 may comprise any suitable pump for,extracting the liquid from the tank 32, and is preferably chosen forcompatibility with the liquid extracted from the tank 32 and forrelatively long maintenance periods. In this embodiment where the liquidis water, the second pumping unit 38 may conveniently comprise awater-powered ejector pump or a diaphragm pump for extracting water fromthe tank 32. In order to inhibit the transfer of vibrations to the tank32 during use, the second pumping unit 38 is connected to the tank usingflexible tubing 44. The internal diameter of the flexible tubing 44 maybe chosen to restrict the flow rate of liquid from the tank 32 to thesecond pumping unit 38. Alternatively, or in addition, a fixed orvariable flow restrictor may be located between the tank 32 and thesecond pumping unit 38.

In order to minimize any pressure fluctuations transmitted from thesystem 30 back to the fluid within the tool, the system 30 includes apressure control system for maintain a substantially constant pressurein the tank 32. In this embodiment, this is achieved by regulating theamounts of liquid and gas within the tank 32.

The amount of liquid contained in the tank 32 is maintained at asubstantially constant level by a controller 46, thereby maintaining asubstantially constant volume of gas in the tank 32. The controller 46is connected to a sensor 48 for detecting the amount of liquid with thetank 32. The sensor 48 may compiles, for example, a level meter, floatmeter or other form of suitable sensor. The sensor 48 outputs a signalto the controller 46 indicative of the level of the liquid within thetank 32. In response to this signal, the controller 46 outputs to avariable flow control device 50 located between the tank 32 and apressurised external liquid source 52 connected to the tank 32 a signalwhich causes the device 50 to vary the flow of liquid, in thisembodiment water, to the tank 32. For example, the device 50 may be abutterfly or other control valve having a conductance that can be variedin dependence on, preferably in proportion to, the signal received fromthe controller 46. By varying the flow rate of the water to the tankfrom the external source 52, the controller 46 can compensate for anyvariation in the flow rate of fluid to the tank 32 from the tool and/orany variation in the rate of extraction of liquid from the tank 32 bythe second pumping unit 38, and thus maintain the liquid in the tank 32at a substantially constant level. The controller 46 may be arranged toprocess the signal received from the sensor 48 to compensate for anyripples generated in the surface of the liquid during use.

With the gas occupying a substantially constant volume within the tank32, any variations in the amount of gas contained in the multi-phasefluid received from the tank, and/or any in the rate of extraction ofgas from the tank 32 by the first pumping unit 36, and any temperaturefluctuations within the tank 32, could vary the pressure of the gaswithin the tank 32, and impart pressure and flow fluctuations to thefluid in the tool. The pressure control system is therefore configuredto maintain a substantially constant pressure within the tank 32 by alsoregulating the amount of gas within the tank 32.

To achieve this, the pressure control system comprises a controller 54connected to a sensor 56 for detecting the gas pressure with the tank32. The sensor 56 may comprise, for example, a pressure sensor, acapacitance manometer or other form of sensor of sufficient sensitivityto achieve the required level of pressure control. The sensor 56 outputsa signal to the controller 54 indicative of the gas pressure within thetank 32. In response to this signal, the controller 54 outputs to avariable flow control device 58 located between the tank 32 and apressurised external gas source 60 connected to the tank 32 a signalwhich causes the device 58 to vary the flow of gas, in this embodimentCDA, to the tank 32, A further variable flow control device 62 may belocated between the tank 32 and the first pumping unit 36 and configuredto receive a signal from the controller 54 to vary the flow of gas fromthe tank 32. For example, the devices 58, 62 may also be butterfly orother control valves having a conductance that can be varied independence on, preferably in proportion to, the signal received from thecontroller 54. By controlling the flow of gas into and out from the tank32, the controller 54 can maintain a substantially constant gas pressurewithin the tank 32.

System 30 provides the capability of extracting a multi-phase fluid fromthe immersion lithography tool while minimizing any pressurefluctuations imparted thereby to the fluid within the tool.

While the foregoing description and drawings represent the preferredembodiments of the present invention, it will be apparent to thoseskilled in the art that various changes and modifications may be madetherein without departing from the true spirit and scope of the presentinvention.

1-22. (canceled)
 23. An extraction system configured to extract amulti-phase fluid from a lithography tool, the extraction systemcomprising: a separator to separate the multi-phase fluid drawn from thelithography tool into a gas phase and a liquid phase; a pump device todraw the multi-phase fluid from the photolithography tool, the pumpdevice comprising: a first pump unit configured to extract gas from theseparator, and a second pump unit configured to extract liquid from theseparator; and a pressure control system configured to control apressure within the separator by regulating an amount of gas and anamount of liquid therein, the pressure control system comprising: a gasopening configured to allow supply of gas to the separator; a liquidopening configured to allow supply of liquid to the separator; and acontrol system configured to control a flow rate of gas to the separatorand control a flow rate of liquid to the separator.
 24. The extractionsystem of claim 23, further comprising a variable flow control devicethrough which gas is supplied to the separator via the gas opening andthe control system is configured to vary a conductance of the variableflow control device to control the pressure within the separator. 25.The extraction system of claim 23, wherein the control system isconfigured to receive a signal indicative of the pressure within theseparator and to control the flow rate of gas to the separator based onthe received signal.
 26. The extraction system of claim 23, wherein thecontrol system is arranged to control a level of liquid within theseparator.
 27. The extraction system of claim 23, wherein the separatorcomprises an extraction tank.
 28. An apparatus comprising: a lithographytool; and the extraction system according to claim
 23. 29. An apparatus,comprising: a nozzle configured to remove a mixture of liquid and gas;and an extraction system configured to draw the mixture through thenozzle, the extraction system comprising: a separator configured toseparate liquid and gas each from the removed mixture; a gas openingconfigured to allow gas to the separator from a source thereof; a liquidopening configured to allow liquid to the separator from a sourcethereof; and a control system configured to control a flow rate of gasto the separator and to control a flow rate of liquid to the separator.30. The apparatus of claim 29, wherein the extraction system is arrangedto maintain a substantially stable pressure within the separator. 31.The apparatus of claim 29, wherein the control system is arranged tocontrol a level of liquid within the separator.
 32. The apparatus ofclaim 29, wherein the control system is configured to control a pressurewithin the separator by regulating the gas and/or liquid therein.
 33. Alithographic apparatus, comprising: a projection device configured toproject a radiation beam onto a substrate; an inlet configured toprovide a liquid to a space between the projection device and thesubstrate; an outlet configured to remove at least part of the liquid asa multi-phase fluid; a separator configured to receive the multi-phasefluid from the outlet, the separator configured to separate the fluidinto gas and liquid phases; a first opening configured to exhaustseparated gas from the separator; and a second opening configured toexhaust separated liquid from the separator, the first opening beinglocated at a different height than the second opening.
 34. The apparatusof claim 33, further comprising a pump arrangement configured to drawthe multi-phase fluid into the separator.
 35. The apparatus of claim 33,further comprising a pump arrangement configured to extract separatedliquid, via the second opening, from the separator.
 36. The apparatus ofclaim 33, further comprising a control system configured to control apressure within the separator by regulating the gas and/or liquidtherein.
 37. The apparatus of claim 33, further comprising a controlsystem configured to control flow of gas from the separator.
 38. Theapparatus of claim 33, further comprising a control system configured tocontrol an amount of liquid within the separator.
 39. The apparatus ofclaim 33, further comprising a flow restriction in a fluid path from theseparator to a pump fluidly connected to the separator.
 40. Theapparatus of claim 33, wherein the separator comprises a chamber havingthe first and second openings therein.
 41. The apparatus of claim 33,wherein the first opening is higher than the second opening.
 42. Theapparatus of claim 33, further comprising a control system configured tocontrol a level of liquid within the separator.